Semiconductor Processing Equipment Applications

Cape Simulations has years of experience in serving the semiconductor processing equipment industry. We have used computer simulation to address issues in:

• Thermal Uniformity
• Thermal Stresses
• Gas Flow Uniformity
• Precursor Mixing
• Gas Phase and Gas-Surface Reactions
• Deposition and Etch Rate Uniformity

Below is a list of equipment and processes where we have used our modeling expertise to help our clients meet their goals. (Visit the Gallery for examples of our work in this area.)

• CVD: Single Wafer Rotating Pedestal Reactor
• CVD: Single Wafer Horizontal Reactor
• MOCVD: Single Wafer Rotating Pedestal
• MOCVD: Multi-wafer Planetary Reactor
• Rapid Thermal Annealing Equipment
• Diffusion/Oxidation Furnaces
• Plasma Generator
• Spin Coating
• Wafer Cleaning
• Wet Processing